Deposition Equipment
Plasmalab 100 PECVD
The Plasmalab 100 PECVD tool allows the deposition of high quality insulating thin films, mainly silicon oxide and silicon nitride that are routinely employed by researchers for a variety of purposes.
*Image courtesy of Oxford Instruments
Intlvac Nanochrome I
Ion assisted DC/RF Sputtering
The Intlvac Nanochrome I system uses a clamshell-style chamber with three different sputter guns and an ion gun for cleaning. It is a fully automated system capable of handling six inch wafers with a touch screen interface for ease of use.
*Image courtesy of Intlvac
Intlvac Nanochrome II
Electron Beam and Thermal Evaporator
The Intlvac Nanochrome II is similar to our sputtering system. It has a clamshell style chamber and can achieve ultimate pressures of 5x10-8 Torr without heating.
*Image courtesy of Intlvac
This equipment can be booked through ACLS after receiving the appropriate inductions.
