Vistec EBPG5000plus
Introduction
Electron Beam Lithography (EBL) is the tool of choice for patterns with extremely high resolution. It makes use of a highly energetic, tightly focused electron beam, which is scanned onto a sample coated by an electron-sensitive polymer according to a geometry that has been previously defined on a CAD file. Subsequent development into an appropriate solvent reveals the structures defined into the polymer, which acts as a mould for subsequent pattern transfer techniques such as dry etching or metal liftoff.
Applications
Due to the extreme flexibility of the technique, EBL has a vast range of applications: nano-electronics, to photonics, plasmonics, nano-fluidics, Nano Electro Mechanical Systems, x-ray and neutron optics.
Equipment
MCN installed a top tier EBL tool, a Vistec EBPG5000plusES, which is the only one of its kind in Australia. The tool is capable of writing up to six inch masks and wafers, with a maximum resolution of less than 10 nm. Some of the key specifications are outlined in the following:
- 100 kV acceleration voltage
- 1 mm main field size
- 50 MHz pattern generator
- automated operation
- <20nm overlay accuracy
Contacts
For more details about the EBL at MCN or enquiries about access please contact:
Dr Matteo Altissimo – matteo.altissimo@monash.edu
This equipment can be booked through ACLS after receiving the appropriate inductions.
