Flagship Equipment
Electron Beam Lithography
Vistec EBPG5000plus
This tool is a state-of-the-art electron beam lithography system by a world leading supplier. This instrument was chosen because it is the main nano-patterning tool in the facility, while the particular supplier was chosen due to the highly specialized technical package offered. This tool is by far the fastest of its kind in Australia.
Areas of research include advanced x-ray optics for the nearby synchrotron, surface patterning for artificial meta-materials, photonic and plasmonic structure for novel sensing platforms, and commercial production of prototype optical security devices.
*Image courtesy of Vistec
In addition to writing structures as small as sub 10nm in size, this tool is also able to write large areas at very high resolution, of the order of 10 nm, in a controlled and repeatable fashion. Prototype devices written on the new EBL tool can be converted at the MCN facility into metal stampers, similar to CD and DVD technology for nano-imprinting into polymer for mass production of new devices.
Focused Ion Beam
Helios Nanolab dual beam FIB/SEM
• High resolution dual-beam Helios focussed ion beam/scanning electron microscope will be one of only 3 of this type in Australia.
• Sub-100 nm direct writing capability using ion beam
• Rapid, 3-D profiling using dual-beam capability will enable direct fabrication of nanostructures and analysis of nano-materials by ion beam milling.
*Image courtesy of FEI
Plasma systems
Plasmalab 100 ICP380
*Image courtesy of Oxford Instruments
The two Plasmalab 100 ICP380 deep reactive ion etchers allow selective processing of materials that have been pre-patterned and masked using other tools in the facility.
These plasma tools were chosen for the flexibility they offer and their advanced technical fit out offered by the supplier. The first ICP380 is devoted to deep silicon etching, using both the Bosch process and cryo-etching process. The other ICP380 system is for general deep etching and RIE of a wide range of materials. Both these tools constitute a unique pair of its kind in Australia, and allow researchers to fabricate novel microsystems.
*Image courtesy of Oxford Instruments
Plasmalab 100 PECVD
*Image courtesy of Oxford Instruments
The Plasmalab 100 PECVD tool allows the deposition of high quality insulating thin films, mainly silicon oxide and silicon nitride that are routinely employed by researchers for a variety of purposes.
Vacuum deposition systems
Intlvac Nanochrome I
Ion assisted DC/RF Sputtering
The Intlvac Nanochrome I system uses a clamshell-style chamber with three different sputter guns and an ion gun for cleaning. It is a fully automated system capable of handling six inch wafers with a touch screen interface for ease of use.
*Image courtesy of Intlvac
Intlvac Nanochrome II
Electron Beam and Thermal Evaporator
The Intlvac Nanochrome II is similar to our sputtering system. It has a clamshell style chamber and can achieve ultimate pressures of 5x10-8 Torr without heating. 
*Image courtesy of Intlvac
Mask Alignment + Nano Imprint Lithography
EVG620
EVG620 UV Automated mask alignment and Nano Imprint Lithography system.
System allows up to 150mm substrates.
*Image courtesy of EVG
Hot Embossing
EVG520IS
The EVG520IS is used to bond a variety of materials together using a variety of different techniques such as thermo compression, anodic and low temperature plasma.
*Image courtesy of EVG
Polymer Electronics Laboratory
Controlled environments for small scale product of new organic photovoltaics e.g. (Solar Cells, OLED etc.)
Atomic Force Microscopy
Veeco ICON AFM System
includes Material Mapping, Electrical Characterization and Nanomanipulation for samples up to 150mm in diameter. Resolutions down to the atomic region are possible.
*Image courtesy of Veeco
Confocal Microscopy
Nikon A1Rsi MP
The Confocal Microscope A1Rsi MP from Nikon can perform real-time spectral unmixing with a high speed resonant scanner allowing imaging of intracellular dynamics. The microscope is designed to integrate with the MCN’s JPK BioAFM for simultaneous imaging.
*Image courtesy of Nikon
Biological AFM
JPK Nanowizard II
The integrated BioAFM Nanowizard from JPK is a new generation AFM designed specifically for biological applications and samples in liquid with heating, gas and liquid exchange capabilities and integration with fluorescence microscopes for simultaneous imaging.
*Image courtesy of JPK