FEI Helios Nanolab Dual Beam FIB installation complete

Installation of the Helios Nanolab 600 dual beam FIB-SEM was completed in June 2010. The ion beam can be used to mill features down to < 50nm in size and SEM resolution is down 5 nanometer.

The tool comes with platinum deposition and enhanced carbon etch capability in addition to EDX and STEM capabilities. Bitmap overlay allows direct writing of complex patterns onto a substrate.

Pictured above from left to right - Douglas Mair (MCN), Aiden Martin (Nanotechnology Systems), Ebb Huggins (FEI) and Dr Matteo Altissimo (MCN).

3 micron MCN logo milled using bitmap overlay

Video of FIB cross section of gold coated polymer spheres

22nd June 2010