Bay 1 is located within the class 10,000 cleanroom area. It houses:

• Materials discovery platform glovebox
• Atomic Layer Deposition (ALD)
• Laser doppler vibrometry
• Metrology (AFM, Stylus)
• Cleanroom consumables store

Bay 6 is located within the class 100 cleanroom area. It houses a range of capabilities including:

• Direct write lithography with robotic sample handling (Heidelberg MLA150)
• Hot embossing and nano-imprint lithography (NIL)
• Talbot lithography (Eulitha PhableR)
• Nanoscribe GT2
• Robotic track system (spin and development)
• Mask alignment (FSA/BSA)
• Spin coating and wafer development

Bay 2 is located within the class 10,000 cleanroom area. It houses:

• Electron beam evaporator
• Thermal evaporator
• 2 x Deep Reactive Ion Etching (DRIE) systems
• Plasma Enhanced Chemical Vapour Deposition (PECVD) system
• 2 x Microwave enhanced diamond deposition systems
• RF/DC Sputtering

Bay 3 is located within the class 10,000 cleanroom area. It houses:

• Automated dicing saw
• Ni Electroplating systems
• Atomic Layer Deposition (ALD) system
• Ellipsometer
• Combinatorial sputtering
• Wet chemistry bays

Bay 4 is located within the class 10,000 cleanroom area. It houses:

• Femtosecond laser processing system
• Electron beam evaporation
• Tabletop Scanning Electron Microscope (SEM)
• Four-stack furnace (doping and PECVD)
• Electronics probe station
• Wire bonder (ball/wedge)

Bay 5 is located within the class 10,000 cleanroom area. It houses:

• Wet chemistry bays
• Metal etch and KOH bench
• Furnaces (oxidation, general purpose)
• Robotic wet bench (Piranha, BOE, RCA2)
• Porous silicon etching
• Plasma asher

The FEG-SEM lab is located within the class 100 cleanroom area. It houses a top-of-the-range Field Emission Gun Scanning Electron Microscope, the Thermo Scientific Apreo 2S as well as an FEI Nova system

The Electron Beam Lithography (EBL) lab is located within the class 100 cleanroom area and is double walled with a raised floor for protection against vibrations which would inhibit the delicate work undertaken on this world-class Vistec EBPG5000plusES.

Small breakout conference room with whiteboard facilities for holding technical discussions or ad-hoc zoom meetings.

The FIB-SEM lab houses the FEI Helios NanoLab 600 Dual Beam Focused Ion Beam Scanning Electron Microscope which is used for a vast range of lithography techniques, while it is also fitted with additional accessories.

This laboratory is reserved for industry clients who have taken up residence at MCN, including ProtonIntel, Eden BDM, Trajan and IBM. See pricing policy for leasing terms.

This laboratory is reserved for the creation of elastomeric PDMS devices and molds. PDMS is ideal in applications involving surfaces which are not flat. Alternatively, PDMS can be used in microfluidic applications, where rapid prototyping and ease of fabrication are important.

The reconfigurable laboratory at MCN is designed for biological and chemical analysis of fabricated devices, nanoparticle characterisation and imaging. It houses:

• High resolution 3D printer
• Inspection microscopes
• Bio-AFM
• Robotic liquid handling
• Zeta sizer
• UV-VIS/IR Spectrophotometer
• UV Ozone Cleaner

The Microscopy laboratory at MCN provides top-of-the-line imaging instrumentation for use on both live and fixed cells. It is equipped with:

• Laser scanning confocal microscope
• Hyperspectral imaging system
• Bio- atomic force microscope
• Confocal Raman
• Laser TIRF system
• Microspectrometer

The Physical Containment laboratory (PC2) at MCN is fully equipped to support research activities involving Risk Group 2 micro-organisms and other rDNA applications exempt from higher classification.

The gowning area is the sole entrance to the cleanroom. All users must gown up in a cleanroom suit, boots, hood, gloves and face mask before they are permitted to enter. This helps to maintain the cleanroom environment, free of foreign contaminates.

Hot desks are available to all MCN users to provide a space for work and meetings outside the cleanrooms and labs.