A practical approach to Reactive Ion Etching presented by Dr Fouad Karouta
MCN Board Room 151 Wellington Rd, ClaytonAbstract After a short introduction of the Australian National Fabrication Facility ACT Node and its capabilities, this talk will focus on general aspects of reactive ion etching (RIE) technique will be described such as anisotropy, loading effect, lag effect, RIE chemistries and micro-masking followed by a brief overview of etching dielectrics (SiOx, SiNx) and crystalline Si. The […]
Free