Nanofabulous Seminar: Approaching Angstrom Scale Resolution in Lithography Using a Universal Resist Platform
“We report on the development of a novel resist platform, i.e., YMORE2 (PSI Metal-Organic Resists for EUV and Electron beam lithographies.” With this platform, we explore the novel metal-organic resists with the aim of improving patterning resolution and reducing line width roughness while retaining sensitivity. It features metal (or metalloid) containing molecular resists with masses <500 Dalton and a highly tailorable organic environment around the central metal atom. Such a flexibility in choosing the organic environment around the central metal atom or metalloid provides a considerable amount of process latitude to adjust the sensitivity and atom economy of these resists. More importantly, the YMORE2 resist platform is a universal scheme for patterning metal / metalloid-containing functional resists compatible with both extreme ultraviolet (EUV) and electron beam lithography (EBL). Furthermore, this resist platform mechanistically unites EBL and EUVL. In my talk, I will start off with a brief historical overview of metal-containing resists and then discuss the patterning results of EUVL and EBL of selected resists and show examples of high-resolution patterning approaching angstrom-scale resolution.
Dr Mohammad S.M. Saifullah
Patterning & Lithography Lead, Eulitha AG, Switzerland;
Paul Scherrer Institut, Switzerland
11:00am, 29/04/2025
Melbourne Centre for Nanofabrication
151 Wellington Road, Clayton, 3168
Zoom link: click here
Meeting ID: 831 2015 9952 passcode: 812241