Nanofabulous Seminar: Atomic layer deposition as an enabling nanotechnology
Atomic layer deposition (ALD) is a true enabling nanotechnology that allows for the preparation of high-quality thin films on challenging surface topologies with excellent step coverage and precisely controlled nanometer dimensions. The semiconductor industry has been the main driving force behind the industrial implementation of ALD in high-volume manufacturing in the last 2 decades, not only in the materials- and 3D-enabled scaling but also in the litho-enabled scaling. Furthermore, ALD has become critical in many more applications including power electronics, microsystems, solar cells, batteries, etc.
In this presentation, the method of ALD will be introduced including a description of its underlying mechanisms, key features and applications. Subsequently some relevant developments in the wider field of atomic scale processing will be discussed.
Prof Erwin Kessels
Department of Applied Physics, Eindhoven University of Technology
Melbourne Centre for Nanofabrication
151 Wellington Road, Clayton, 3168
Zoom link: click here
Meeting ID: 826 1240 3047 and passcode: 971404