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Influence of Ionic Strength on the Deposition of Metal−Phenolic Networks
Langmuir
J. Guo, J. J. Richardson, Q. A. Besford, A. J. Christofferson, Y. Dai, C. W. Ong, B. L. Tardy, K. Liang, G. H. Choi, J. Cui, P. J. Yoo, I. Yarovsky, and F. Caruso,

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