New instruments and capabilities at MCN

The Pico Track PCT-150RRE in use by MCN' staff 
The automated developer system which compliments the Pico Track PCT-150RRE

Pico Track PCT-150RRE

In a serious advance for wafer processing consistency, throughput and efficiency, MCN has recently installed a Pico Track PCT-150RRE in the class 100 cleanroom to enable automated spin-coating and development of wafers.

A photolithography tool which is used for all process steps before and after exposure, the track system offers users options for both high throughput and single wafer runs while utilising a fully automated and precise robotic system. It is capable of running wafer sizes of 4" and 6" diameter with no change over requirements. Comprised of numerous spin modules, the system can adapt to virtually all photolithography processes with precision and produce patterned wafers with extremely high uniformity. The track system automates all steps continuously including adhesion promoter, pre-baking, resist coating, edge-bead removal (EBR), development, and post-baking.

In addition to the Pico Track, MCN has installed a stand-alone automated developer system for enhanced photolithography processing. Capable of running 2" up to 6" wafer sizes, this new developer system can be used by itself, or in-conjunction with the Pico Track to provide more resist development options for the users of MCN.

MCN anticipates the systems will be available for use in late February 2015.  For any questions around the systems capabilities or availabilities please contact Senior Process Engineer, Bernie Orelup.

ICnanoS2 scanning ion conductance microscope

Co-funded under the MCN and ARC LIEF policy, a scanning ion conductance microscope has recently been installed in the MCN biochemistry lab.

The ICnanoS2 scan head offers a state-of-the-art closed-loop scan system that ensures accurate measurements, low noise levels and sub-nanometer resolution. With an XY scan range of 100μm and a Z scan range of 25μm, it is suited for imaging both living cells and materials. It allows up to 15 mm movement while maintaining sub-nanometer positioning accuracy. The scan head fits a wide variety of modern models of inverted microscopes and integrates with many complementary techniques including confocal microscopy, SECM and electrophysiology.

For more information, please contact Client Services Manager, John Zhu.

Updates to e-Beam evaporator

One of MCN’s key instruments, the Intlvac Nanochrome II Electron Beam and Thermal Evaporation System, has undergone software upgrades that now provide a host of new features and functionalities.

The newly upgraded system now allows for comprehensive automation of nearly all instrument operations. Manual control and process monitoring have been replaced with IntlVac's latest NanoCon software. The new user interface all but eliminates the need for user interaction and should vastly improve rate and thickness control and run-to-run consistency.

Single films or multi-material stacks are easily created using simple layer definitions. Operators can modify ramp and soak parameters, deposition rates, target thicknesses, e-beam settings, and can also make use of ion-beam pre-cleaning and sample heating. Another new feature is the ability to perform ion-beam and heat assisted depositions. Lastly, for those processing on 6" wafers, we have purchased a new 6" planetary dome capable of holding 15 pieces.

For more information or to receive training on the new system, please contact Process Engineer, Yang Lim.